| European Case Law Identifier: | ECLI:EP:BA:2015:T201714.20150306 | ||||||||
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| Date of decision: | 06 March 2015 | ||||||||
| Case number: | T 2017/14 | ||||||||
| Application number: | 10177935.3 | ||||||||
| IPC class: | C23C 14/34 H01L 21/28 H01L 21/285 H01L 21/768 C22C 9/01 C22C 9/02 |
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| Language of proceedings: | EN | ||||||||
| Distribution: | D | ||||||||
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| Title of application: | Copper alloy sputtering target, process for producing the same and semiconductor element wiring | ||||||||
| Applicant name: | JX Nippon Mining & Metals Corporation | ||||||||
| Opponent name: | - | ||||||||
| Board: | 3.2.07 | ||||||||
| Headnote: | - | ||||||||
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| Keywords: | Inventive step - main request and first and second auxiliary requests (no) Late-filed third auxiliary request - admitted (no) |
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Source: http://www.epo.org/law-practice/case-law-appeals/recent/t142017eu1.html
Date retrieved: 17 May 2021