| European Case Law Identifier: | ECLI:EP:BA:2004:T103401.20040129 | ||||||||
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| Date of decision: | 29 January 2004 | ||||||||
| Case number: | T 1034/01 | ||||||||
| Application number: | 93119391.6 | ||||||||
| IPC class: | H01J 37/32 | ||||||||
| Language of proceedings: | EN | ||||||||
| Distribution: | C | ||||||||
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| Title of application: | Process and electromagnetically coupled planar plasma apparatus for etching oxides | ||||||||
| Applicant name: | APPLIED MATERIALS, INC. | ||||||||
| Opponent name: | Institute of Technological Information, Inc. | ||||||||
| Board: | 3.4.03 | ||||||||
| Headnote: | - | ||||||||
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| Keywords: | Abuse of procedure (no) Lack of inventive step of one alternative of an independent claim renders the whole claim not allowable (cf. Reasons for the Decision, item 6.6) Inventive step (denied) |
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Source: http://www.epo.org/law-practice/case-law-appeals/recent/t011034eu1.html
Date retrieved: 17 May 2021