| European Case Law Identifier: |
ECLI:EP:BA:2003:T071099.20030211 |
| Date of decision: |
11 February 2003 |
| Case number: |
T 0710/99 |
| Application number: |
90109477.1 |
| IPC class: |
H01L 21/00 |
| Language of proceedings: |
EN |
| Distribution: |
C |
| Download and more information: |
|
| Title of application: |
Multiple chamber staged-vacuum semiconductor wafer processing system |
| Applicant name: |
APPLIED MATERIALS |
| Opponent name: |
Institute of Technological Information, Inc. |
| Board: |
3.4.03 |
| Headnote: |
- |
| Relevant legal provisions: |
|
| Keywords: |
New requests filed during the oral proceedings before the Board - admitted (see point 2.4 of the "Reasons for the Decision") |
| Catchwords: |
-
|
| Cited decisions: |
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| Citing decisions: |
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